PURE SILICON ULTRASM® TEM WINDOWS
5 nm, 9 nm, 15 nm, and NANOPOROUS
TEMwindows Handling Instructions
Read more about the unique combination of enabling features and benefits.
- Nanometer Thinness: thinner than the thinnest available carbon grids
- Plasma Cleanable: Silicon UltraSM grids can be vigorously plasma cleaned to remove organic contamination, unlike carbon grids
- Increased Uniformity: reduced field-to-field variability
- Increased Stability: at high beam currents and high annealing temperatures (600C for non-porous, >1000C for nanoporous)
- Reduced Chromatic Blur: half the chromatic blur of carbon grids
- Nanometer-Scale Pores: allow stable suspension of nanoscale materials for imaging without background
- Silicon Composition: sputter-deposited, pure, intrinsic silicon
- Minimal Background Signal: enables elemental analyses of samples containing nitrogen and/or carbon
NOTE: US100-P30 replaced US200-P15. P30 Membranes are 3X more porous than P15. P15 is still available by special order.
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