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PURE SILICON ULTRASM® TEM WINDOWS
Read more about the unique combination of enabling features and benefits here.
- Nanometer Thinness: thinner than the thinnest available carbon grids
- Plasma Cleanable: unlike carbon grids, can vigorously plasma clean to remove organic contamination
- Uniformity: reduced field-to-field variability
- Reduced Chromatic Blur: half the chromatic blur of carbon grids
- Nanometer-Scale Pores: allow stable suspension of nanoscale materials for imaging without background
- Silicon Composition: sputter-deposited, pure, intrinsic silicon
- Increased Stability: at high beam currents and high annealing temperatures
- Minimal Background Signal: enables elemental analyses of samples containing nitrogen and/or carbon
Lead Selenide nanoparticles on 5 nm non-porous UltraSM® TEM Window (left) and conventional carbon film (right). Particles provided by Chris Evans, University of Rochester and imaged by Brian McIntyre, University of Rochester.
 
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