|
|
|
|
 |
|
|
|
SUBSTRATES FOR SAMPLE DEPOSITION & ANALYSIS
If you need a robust substrate on which to deposit films or grow
nanoparticles or nanowires, we recommend the following TEM Windows:
-
Non-porous 15 nm thick UltraSM TEM Windows are
our most robust pure silicon films. These amorphous films offer plasma
cleanability, tunable surface hydrophobicity and the ability to analyze
for nitrogen, oxygen and carbon without background signals.
-
Porous 15 nm thick UltraSM TEM Windows are
just like the films listed above, but have numerous 10-50 nm diameter
pores to suspend nanomaterials for imaging or growth. The
polycrystaline structure provides an internal sizing and diffraction
pattern calibration standard as well.
-
Silicon Nitride 20 & 50 nm thick TEM Windows are our most robust, flat and hydrophilic substrates for demanding sample preparation procedures.
-
Silicon Oxide 20 & 40 nm thick TEM windows offer an ideal surface for high-temperature nanomaterial growth of specimens.
Want to compare physical characteristics and grid formats? See detailed technical comparisons here.
FEATURED TEM WINDOWS:
|
|
|
|
