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SUBSTRATES FOR SAMPLE DEPOSITION & ANALYSIS
We recommend the following TEM Windows that can act as a robust substrate on which to deposit films or grow nanoparticles or nanowires:
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10, 20 & 50 nm thick Silicon Nitride TEM Windows are our most robust, flat and hydrophilic substrates for demanding sample preparation procedures.
- 15 nm thick UltraSM® Pure Silicon TEM Windows are
our most robust pure silicon films. These amorphous films offer plasma
cleanability, tunable surface hydrophobicity and the ability to analyze
for nitrogen and carbon without background signals.
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NANOPOROUS UltraSM® Pure Silicon TEM Windows are
similar to the non-porous windows, but have numerous 10-50 nm diameter
pores that can suspend nanomaterials for imaging or growth. The
polycrystaline structure provides an internal sizing and diffraction
pattern calibration standard as well.
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20 & 40 nm thick Silicon Dioxide TEM windows offer an ideal surface for high-temperature nanomaterial growth of specimens.
Explore how the robustness and other technical properties of SiMPore's TEM Windows grids compare.
FEATURED TEM WINDOWS:
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