Silicon Nitride (SiN) TEM Windows Low-Stress Silicon Nitride (NOW MORE CONDUCTIVE)- 100 micron thick frame, fits 3 mm sample holders
- 5 nm thick Silicon Nitride film
- (2) 50 x 1500 micron window
- Non-Porous
What's NEW? We have developed a novel conductive coating for our two-slot 5 nm silicon nitride film using a premium high-temperature ultrathin carbon coating. The benefits include:
- Efficient charge dissipation for minimal sample charging
- High resolution, high stability imaging
- Clean, consistent and low-contrast background
- Superior image quality even at high tilt
We've also reduced the width of the slots to 50 microns. This makes slots more robust during sample preparation while also reducing the incidence of vibration during imaging. Low vibration is particularly important for tomography and high-tilt applications.
Note: It has been reported that the 5 nm silicon nitride windows may have slight wrinkling (significantly less than silicon dioxide or pure silicon). This does not affect TEM imaging.
Improved Grid Shape
We have re-engineered our TEM grids so that they are easier
to handle. By making the grids slightly
narrower users now have easy access to grids in TEM holders. No more fumbling
with tweezers while trying to pick up or put down grids. The new TEMWindow grid shape is still
compatible with all standard holders.
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